Thrust 1: Area-unlimited dual-wavelengths digital light projection additive manufacturing
Tri-wavelength structured light illumination with spatial and temporal projection control. Hierarchically precise micro- and nano- structured polymeric materials has important impact for thermal management and photonic meta-materials. It has remained challenging for conventional approaches to achieve precise control in material structures across multiple length-scales (nm – um) at large area.In our lab, we developed dual- and expaning to tri-wavelengths digital light projection (DLP) to achieve super-resolution patterning (sub 500 nm) and multi-material patterning. Spatially and temporally controlled laser structured light illumination is achieved using computer programmed laser and digital micro-mirror devices. This platform is currently combined with wavelength-specific photochemistry, ranging from controlled living radical polymerization [1], photo-isomers and dual-cure polymer precursors systems, to explore capability of nano-resolution patterning, control of photoisomerization kinetics and multi-material printing at micrometer lengthscale.
Semi-analytical transport model development for parametric search in super-resolution patterning. Understanding the chemical reaction at the dual-wavelength projection interface combined with monitoring of in-situ photochemical reaction progression is critical to achieve control for super-resolution printing and material boundary development. To this end, our lab has developed semi-analytical theoretical model to search for the optimal parameters to achieve super-resolution printing [2].
